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Patterned Magnetic Media

  Fabrication of Patterned Media


Conceptually, patterned media is very simple. However, mass producing disks at reasonable cost is an immense challenge. To see why, consider how small the islands have to be: At 100 Gbit/sq. inch (roughly equivalent to today's shipping drives), the islands need to have a center-to-center spacing of 86 nanometers. To move to 1 Tbit/sq. inch (well beyond the capability of today's longitudinal media), a spacing of 27 nm is needed. At 10 Tbit/sq. inch, this spacing is just 9 nm. These dimensions are well beyond the capability of optical lithography -- the technique used by the electronics industry to make integrated circuits. To generate features for patterned media, two challenging approaches are proposed: e-beam lithography and nanoimprint replication.

Nanoimprint replication is a potentially low-cost method of stamping a nm-scale resist pattern on disks for subsequent etching steps. E-beam lithography is one of a very few techniques that can be used to create the stamper whose nm-scale patterns are replicated by the nanoimprint process.

Here's how it is all envisioned to work:

A state-of-the-art e-beam exposure tool (similar to what is used to make masks for optical lithography in the electronics industry, but with significantly higher resolution) creates the desired patterns in a resist layer on the stamper substrate (Fig. 3a). After developing, this patterned resist becomes a mask for etching a pattern of holes into the surface of the stamper (Fig. 3b).

A thin layer of UV-curable liquid resist is coated on the disk substrate, and the patterned stamper is pressed into the resist layer. While the stamper is in contact with the resist, UV light is projected through the stamper onto the disk (Fig. 3c), which polymerizes the liquid, hardening it into a solid which replicates the features on the surface of the stamper. This patterned resist then becomes a mask for etching pillars on the disk surface (Fig. 3d). The magnetic recording layer is deposited over this array of pillars, resulting in elevated magnetic islands (Fig. 3e). The residual magnetic layer at the bottom of the pillars does not play a role in the recording process, since only the magnetic material closest to the head (flying over the surface of the disk) is sensitive to the recording head's writing field. As with conventional disks, a thin hard overcoat and lubricant layer is applied over the magnetic layer to provide a mechanically robust head-disk interface.

 Figure 3a (Fabrication of Patterned Media)  Download

 Figure 3b-3e (Fabrication of Patterned Media)  Download

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