Caption:
Schematic
explanation of analogy between
optical and magnetic lithography:
a)
In the case of optical lithography
externally applied source of
light penetrates through openings
in the optical mask and selectively
exposes light sensitive photo
resist.
b)
In ML, externally applied magnetic
field magnetizes soft magnetic
material elements of the magnetic
mask. Magnetic field generated
by the soft magnetic material
elements causes reduction (or
complete cancellation) of externally
applied field in the close proximity
of the magnetic mask, effectively
allowing magnetic field to penetrate
only through the openings in
the magnetic mask. If magnetic
media is initially magnetized
in one direction (right-to-left),
and if subsequently opposite
polarity magnetic field is applied
to the magnetic media in the
close proximity or contact to
the magnetic mask, the direction
of the magnetization will be
reversed only in the areas corresponding
to the openings in the magnetic
mask.
